Photoemission Electron Microscopy / X-ray Absorption Spectroscopy

The PEEM/XAS beamline is dedicated to microscopy and spectroscopy in the absorption of soft X-rays and is equipped with two end-stations: a photoemission electron microscope (PEEM), and a universal station for X-ray absorption spectroscopy (XAS). The beamline is designed to study chemical and electronic and magnetic properties by means of XAS and XMCD (X-ray magnetic circular dichroism), respectively. It is suitable for probing element specific properties of surfaces, interfaces, thin films and nanomaterials.

Contact: Marcin Zając
Tel: +48 12 664 4159 (office) | +48 12 664 4192 (beamline)

Technical specifications

The both end stations are served by beamline, which can deliver linearly (horizontal) and elliptically polarized light in the photon energy range 200–2000 eV.

Sample environment

The PEEM end station is a fully equipped “surface science laboratory”. It includes a load-lock and an entrance chamber for fast sample transfer from air into the ultrahigh vacuum (UHV) environment, a preparation chamber, the main microscopic chamber. The preparation chamber includes LEED and Auger spectrometers, several evaporation sources, an ion sputtering source, and a gas dosing system, thermal annealing process up to 2000 K. An additional evaporation source is mounted in the main chamber for real time microscopy during the deposition.

When planning your XPEEM experiment, consider that samples have to fulfil main restrictions (like be UHV compatible, flat and should not charge under illumination, must fit a sample holder that limits dimensions from 5 mm to 14 mm in diameter and 3 mm in height). Available temperature in imaging chamber is several hundred degree Celsius.

The XAS end station is a UHV system equipped with two-chambers (one for spectroscopy and other for preparation). For sample a standard flag-style (Omicron plate) sample holder is used. The available detection mode are described at the beamline website. The 4-axes cryogenic manipulator allows for measurements in broad temperature range and external magnetic field of maximum 2 kOe in direction parallel to the beam. Available facilities of preparation chamber are several evaporation sources, a quadrupole mass spectrometer, manipulator with sample preparation temperature from 100 K to 2000 K, LEED and Auger spectrometer, a precision leak valves, ion sputtering source and a sample storage.

Detailed information can be found on the beamline’s main homepage.